|
|||||
|
|
Electrochemical properties of boron-carbon-nitride films formed by magnetron sputtering |
|
| Authors: | Eungsun Byon Myungsook Son Kee-Seok Nam Katsuhisa Sugimoto |
| Affiliation: | a Surface Engineering Center, Korea Institute of Machinery and Materials, 66 Sangnam-Dong, Changwon 641-010, Republic of Korea b Samsung Techwin Co. Ltd., 647-9, Yeoksam-Dong, Seoul 135-080, Republic of Korea c Department of Metallurgy, Graduate School of Engineering, Tohoku University, 6-6-02 Aza-Aoba, Aramaki, Aoba-Ku, Sendai 980-8579, Japan |
| Abstract: | The electrochemical behavior of B1.0C2.4N1.0 thin film was investigated in acidic, neutral and alkaline solutions. The anodic polarization curve of the film in 1 M NaOH showed the anodic dissolution of the film. The curve of the film in 1 M HCl showed no anodic dissolution. The cathodic polarization curve in 1 M NaCl showed shift to a negative potential side, but the anodic polarization curve was the same as that of Pt. The anodic dissolution in 1 M NaOH depended on potentials, that is, no anodic dissolution was recognized in a potential range of −0.2 to 0.1 V but the dissolution rate increased with increasing potential in a range of 0.1-0.6 V. The anodic current density of the film is directly proportional to the dissolution rate at potentials higher than 0.1 V. The dissolution rate of the film was increased with increasing solution pH. |
| Keywords: | Electrochemical properties Boron-carbon-nitride films Magnetron sputtering Chemical composition |
| 本文献已被 ScienceDirect 等数据库收录！ | |