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Recrystallization and precipitation behavior of low-activation V-Cr-Ti alloys after cold rolling
Authors:N.J. Heo  T. Nagasaka
Affiliation:a Department of Fusion Science, School of Mathematical and Physical Science, The Graduate University for Advanced Studies, Toki-shi, Gifu 509-5292, Japan
b National Institute for Fusion Science, Toki-shi, Gifu 509-5292, Japan
Abstract:Recrystallization and precipitation behavior after cold working were investigated for three V-4Cr-4Ti alloys, NIFS-HEAT-1, NIFS-HEAT-2 and US 832665, which contain different levels of impurities. The decrease in hardness and the initiation of recrystallization against test temperature do not depend on the oxygen level. However, the rate of grain growth decreased with the increase in the impurity levels. Bimodal distribution of the precipitates was observed after annealing at 1273 K. The large precipitates were Ti-rich precipitates, and the small ones were composed mainly of Ti, C and O (Ti-C-O precipitates). The impurities were dissolved from Ti-C-O precipitates above 1273 K, and the level of impurities in the matrix increased and resulted in the increase in the hardness. Based on the results, the annealing temperature for V-4Cr-4Ti alloys is recommended not to exceed 1273 K for the purpose of maintaining good mechanical properties such as tensile and impact properties.
Keywords:I0100   P1100   R0800   V0100
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