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Material Growth and Device Fabrication of GaN-Based Blue-Violet Laser Diodes
Material Growth and Device Fabrication of GaN-Based Blue-Violet Laser Diodes[J]. Journal of Semiconductors, 2005, In Press. Material Growth and Device Fabrication of GaN-Based Blue-Violet Laser Diodes[J]. Chin. J. Semicond., 2005, 26(2): 414.Export: BibTex EndNote
Authors:Yang Hui  Chen Lianghui  Zhang Shuming  Chong Ming  Zhu Jianjun  Zhao Degang  Ye Xiaojun  Li Deyao  LIU Zongshun  Duan Lihong  Zhao Wei  Wang Hai  Shi Yongsheng  Cao Qing  Sun Jie  Chen Jun  Liu Suying  Jin Ruiqin  Liang Junwu
Abstract:Studies on first GaN-based blue-violet laser diodes(LDs) in China mainland are reported.High quality GaN materials as well as GaN-based quantum wells laser structures are grown by metal-organic chemical vapor deposition method.The X-ray double-crystal diffraction rocking curve measurements show the full width half maximum of 180″ and 185″ for (0002) symmetric reflection and (10-12) skew reflection,respectively.A room temperature mobility of 850cm2/(V·s) is obtained for a 3μm thick GaN film.Gain guided and ridge geometry waveguide laser diodes are fabricated with cleaved facet mirrors at room temperature under pulse current injection.The lasing wavelength is 405.9nm.A threshold current density of 5kA/cm2 and an output light power over 100mW are obtained for ridge geometry waveguide laser diodes.
Keywords:metalorganic chemical vapor deposition  GaN-based laser diodes  multiple quantum wells  ridge geometry structure  threshold current density
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