Triangle pore arrays fabricated on Si (111) substrate by sphere lithography combined with metal-assisted chemical etching and anisotropic chemical etching |
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Authors: | Hidetaka Asoh Kosuke Fujihara Sachiko Ono |
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Affiliation: | 1.Department of Applied Chemistry, Kogakuin University, 2665-1 Nakano, Hachioji, Tokyo, 192-0015, Japan |
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Abstract: | ABSTRACT: The morphological change of silicon macropore arrays formed by metal-assisted chemical etching using shape-controlled Au thin film arrays was investigated during anisotropic chemical etching in tetramethylammonium hydroxide (TMAH) aqueous solution. After the deposition of Au as the etching catalyst on (111) silicon through a honeycomb mask prepared by sphere lithography, the specimens were etched in a mixed solution of HF and H2O2 at room temperature, resulting in the formation of ordered macropores in silicon along the [111] direction, which is not achievable by conventional chemical etching without a catalyst. In the anisotropic etching in TMAH, the macropores changed from being circular to being hexagonal and finally to being triangular owing to the difference in etching rate between the crystal planes. |
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Keywords: | Silicon Metal-assisted chemical etching Colloidal crystal templating Sphere lithography Anisotropic chemical etching Triangle pore arrays |
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