GaAsSb/InGaAs tunnel field effect transistor with a pocket layer |
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Affiliation: | 1. Lab of Power Semiconductor Devices &Ics, Beijing University of technology, Beijing 100124, China;2. Shenzhen Jihua Micro Special Electronics Limited Company, Shenzhen 518000, China |
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Abstract: | This work proposes a new GaAs0.51Sb0.49/In0.53Ga0.47As heterojunction tunnel field effect transistor (HTFET) with a 6-nm In0.7Ga0.3As layer (pocket) between the source and channel. Compared with InGaAs homojunction TFETs, the proposed HTFET has a steeper subthreshold swing at a higher drain current, owing to its lower source-to-channel tunnel barrier height. It has a maximum on-state current of 11.98 μA/μm at room temperature, which is more than ten times the on-state current obtained from an InGaAs homojunction TFET. |
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