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| 大口径KDP晶体加工相位扰动与三次谐波转换 | |
| 引用本文： | 季来林,刘崇,唐顺兴,陈明,冯伟,朱宝强,马伟新,朱俭,戴亚平,林尊琪. 大口径KDP晶体加工相位扰动与三次谐波转换[J]. 中国激光, 2012, 39(5): 502012-72 |
| 作者姓名： | 季来林 刘崇 唐顺兴 陈明 冯伟 朱宝强 马伟新 朱俭 戴亚平 林尊琪 |
| 作者单位： | 季来林:中国科学院上海光学精密机械研究所， 上海 201800中国科学院上海激光等离子体研究所， 上海 201800 刘崇:中国科学院上海光学精密机械研究所， 上海 201800 唐顺兴:中国科学院上海光学精密机械研究所， 上海 201800 陈明:中国科学院上海激光等离子体研究所， 上海 201800 冯伟:中国科学院上海激光等离子体研究所， 上海 201800 朱宝强:中国科学院上海光学精密机械研究所， 上海 201800 马伟新:中国科学院上海激光等离子体研究所， 上海 201800 朱俭:中国科学院上海激光等离子体研究所， 上海 201800 戴亚平:中国科学院上海激光等离子体研究所， 上海 201800 林尊琪:中国科学院上海光学精密机械研究所， 上海 201800 |
| 摘 要： | 根据神光Ⅱ三次谐波转换中的各种现象,分析了晶体中高频周期相位调制的影响。目前国内大口径KDP晶体在中高频段存在强烈周期性相位调制,相位调制周期约20mm,调制幅度约35nm,导致三次谐波近、远场产生明显的强度调制,实验测得三倍频的近场周期条纹对比度在0.1～0.3之间,周期约12mm,理论分析该周期相位调制导致光束下游元件产生自聚焦风险明显增大,并且会引起三倍频远场畸变分裂,可聚焦能力下降。中高频段的周期调制可能来自于晶体加工过程中真空吸附,需要进一步实验判断并在加工中消除周期性的相位扰动。 |
| 关 键 词： | 非线性光学 相位扰动 三次谐波转换 晶体加工 |
| 收稿时间： | 2011-12-28 |
Phase Perturbation of Large Aperture KDP Crystal Manufacture and Effects on Third Harmonics Generation |
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| Ji Lailin,Liu Chong,Tang Shunxing,Chen Ming,Feng Wei,Zhu Baoqiang,Ma Weixin,Zhu Jian,Dai Yapin,Lin Zunqi. Phase Perturbation of Large Aperture KDP Crystal Manufacture and Effects on Third Harmonics Generation[J]. Chinese Journal of Lasers, 2012, 39(5): 502012-72 | |
| Authors: | Ji Lailin Liu Chong Tang Shunxing Chen Ming Feng Wei Zhu Baoqiang Ma Weixin Zhu Jian Dai Yapin Lin Zunqi |
| Affiliation: | 1(1Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China 2Shanghai Institute of Laser and Plasma,Chinese Academy of Sciences,Shanghai 201800,China) |
| Abstract: | The effects of period phase perturbation of large aperture KDP crystal in middle spatial frequency are analyzed based on the results of experiments of Shenguang II. The period of phase perturbation of crystal reflection wavefront is near 20 mm, and the modulation amplitude is about 35 nm, the period of the third harmonics near field is about 12 mm, the contrast of strip is between 0.1 and 0.3, which leads to 3ω far field distortion and the probability of self-focusing increase. This cycle modulation at medium high frequency is possible caused by vacuum siphon in the process of crystal manufacture, and it needs to be verified in the follow-up experiment. |
| Keywords: | nonlinear optics phase perturbation third harmonic generation crystal manufacture |
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