| 单头单面旋转式化学机械抛光机的运动机理研究 |
| |
| 引用本文： | 顾坚,李正兴,赵永武,王永光.单头单面旋转式化学机械抛光机的运动机理研究[J].煤矿机械,2006,27(8):39-41. |
| |
| 作者姓名： | 顾坚 李正兴 赵永武 王永光 |
| |
| 作者单位： | 江南大学,机械工程学院,江苏,无锡,214122 |
| |
| 摘 要： | 以单头单面旋转式化学机械抛光机为例建立了抛光头的运动模型,并利用Matlab软件模拟出了抛光头的运动轨迹,分析并讨论了抛光盘和抛光头两者之间不同的转速比、旋转方向、偏心距以及抛光点的初始位置等参数对抛光轨迹和抛光质量的影响,为CMP机床的结构和运动设计提供理论依据。
|
| 关 键 词： | 化学机械抛光(CMP) 运动模型 转速比 偏心距 |
| 文章编号： | 1003-0794（2006）08-0039-03 |
| 收稿时间： | 2006-04-25 |
| 修稿时间： | 2006年4月25日 |
Study on Kinematic Mechanism of Rotary CMP Equipment with Single Head |
| |
| GU Jian,LI Zheng-xing,ZHAO Yong-wu,WANG Yong-guang.Study on Kinematic Mechanism of Rotary CMP Equipment with Single Head[J].Coal Mine Machinery,2006,27(8):39-41. |
| |
| Authors: | GU Jian LI Zheng-xing ZHAO Yong-wu WANG Yong-guang |
| |
| Affiliation: | College of Mechanical Engineering, Southern Yangtze University, Wuxi 214122, China |
| |
| Abstract: | A kinematic model of polishing head in CMP is developed and the kinematic traces of the polishing head are simulated by software Matlab. The effects of variables to polishing traces and quality, such as rotational speed ratio and directions of polishing pad and head, eccentric distance and initial position of polishing are analyzed for providing theoretical guide to design the structure and motion mode of the CMP equipment. |
| |
| Keywords: | chemical mechanical polishing(CMP) kinematic model rotational speed ratio eccentric distance |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
|
