Effects of anodisation parameters on thin film properties: a review |
| |
| Authors: | Y. H. Wong M. G. Affendy S. K. Lau P. C. Teh H. J. Lee C. Y. Tan |
| |
| Affiliation: | 1. Department of Mechanical Engineering, Faculty of Engineering, University of Malaya, Kuala Lumpur 50603, Malaysiayhwong@um.edu.my;3. Department of Mechanical Engineering, Faculty of Engineering, University of Malaya, Kuala Lumpur 50603, Malaysia;4. School of Metallurgy and Materials, University of Birmingham, Edgbaston, Birmingham, West Midlands, B15 2TT, United Kingdom;5. Center for Photonic Technologies, Universiti Tenaga Nasional, Bandar Baru Bangi, Selangor 43650, Malaysia |
| |
| Abstract: | Electrochemical anodisation is a well-received method in the complementary metal-oxide-semiconductor field as it is advantageous; best performed at room temperature which translates into being more affordable and a simple alternative to form nano-structured oxide films for different metals. The quintessential parameters involved allow numerous formations of metal oxide films according to desired morphology and thickness. Therefore, this paper aims to review the effects of anodising parameters such as applied voltage, concentration, temperature, time, current density and post-anodisation annealing among them. |
| |
| Keywords: | Anodisation Thin films Applied voltage Temperature Thickness |
|
|
