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Characteristics of Ir etching using Ar/Cl |
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| Authors: | SE-GEUN PARK CHIN-WOO KIM HO-YOUNG SONG HYOUN WOO KIM JU HYUN MYUNG SUKHO JOO SOON OH PARK KYU-MANN LEE |
| Affiliation: | (1) Micro Photonics Advanced Research Center, School of Information and Communication Engineering, Inha University, Incheon, 402-751, Korea;(2) School of Materials Science and Engineering, Inha University, Incheon, 402-751, KoreaEmail: hwkim@inha.ac.kr;(3) Semiconductor R&D Center, Samsung Electronics Co. Ltd., Kyungki, 449-900, Korea;(4) Department of Materials Engineering, Korea University of Technology and Education, Chonan, Chungnam, 330-860, Korea |
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