RF Sputtered gold-amorphous silicon Schottky-barrier diodes

Gold Schottky-barrier diodes formed on reactively sputtered amorphous silicon thin films have been investigated. Device forwardI-Vcharacteristics are well modeled as a Schottky diode in series with a temperature activated series resistor. At 300K, the forward current indicates a diode correction factor of 1.4 and a saturation current of 5.8 × 10^-10A/cm². The metal-semiconductor barrier height is 0.93 eV. Capacitance versus frequency measurements indicate a depletion region thickness of 3000 Å. In the depletion region, the mobility-lifetime products are estimated to be of the order of 5 × 10^-11cm²/V which is substantially less than the value of 10^-7cm²/V in the quasi-neutral region, It is suggested that deep gap states are responsible for this difference. Carrier recombination in the depletion region limits the photovoltaic performance.