降低DLC薄膜应力的方法研究 |
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引用本文: | 朱昌,邵霄,梁海锋.降低DLC薄膜应力的方法研究[J].西安工业大学学报,2007,27(5):416-420. |
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作者姓名: | 朱昌 邵霄 梁海锋 |
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作者单位: | 西安工业大学陕西省薄膜技术与光学检测重点实验室 西安710032 |
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基金项目: | 表面工程技术国防科技重点实验项目 |
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摘 要: | 为了沉积出高硬度、低应力、高膜-基结合强度的类金刚石硬质薄膜,利用脉冲电弧离子镀技术在高速钢基底上制备类金刚石薄膜,采用退火、增加Ti过渡层、Ti离子轰击等方法减小DLC薄膜应力.结果表明:单层DLC薄膜的应力可达7.742 GPa;以Ti为过渡层的DLC薄膜的应力减小为2.027 GPa;对Ti/DLC薄膜进行退火热处理,薄膜应力减小到0.359GPa.利用Ti作过渡层,并且对薄膜进行退火处理,可以使DLC薄膜产生的高应力在Ti层中得到明显减小,提高膜-基结合力,增加硬度.
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关 键 词: | 脉冲电弧 应力 类金刚石(DLC)薄膜 X射线衍射法 |
文章编号: | 1673-9965(2007)05-416-05 |
收稿时间: | 2007-07-12 |
修稿时间: | 2007年7月12日 |
Study on Reducing Intrinsic Stress Of Diamond-Like Carbon Films |
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Authors: | ZHU Chang SHAO Xiao LANG Hai-feng |
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Abstract: | With the pulse electric arc ion,the DLC films are produced on the high-speed steel with higher hardness on the surface.The properties of the low stress and high adhesion between film and metal basis are obtained.The processes of anneal,adding a transitional Ti layer and Ti ion bombardment are applied to minish DLC film's stress.The result indicates that the stress of the annealed Ti/DLC films reduces to 0.359 GPa,compared with 2.027 GPa of Ti/DLC films and 7.742 GPa of DLC films without anneal.Meanwhile,the adhesion and the surface hardness of the film are increased. |
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Keywords: | pulse electric arc stress diamond-like carbon(DLC) films X radial diffraction |
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