Density of States-Based DC $I$– $V$ Model of Amorphous Gallium–Indium–Zinc-Oxide Thin-Film Transistors

The density of states (DOS)-based DC I-V model of an amorphous gallium-indium-zinc oxide (a-GIZO) thin-film transistor (TFT) is proposed and demonstrated with self-consistent methodologies for extracting parameters. By combining the optical charge-pumping technique and the nonlinear relation between the surface potential (phiS) and gate voltage (V _GS), it is verified that the proposed DC model reproduces well both the measured V _GS-dependent mobility and the I _DS-V _GS characteristics. Finally, the extracted DOS parameters are N _TA = 4.4 times 10¹⁷ cm^-3 middot eV^-1, N _DA = 3 times 10¹⁵ cm^-3 middot eV^-1, kT _TA = 0.023 eV, kT _DGA = 1.5 eV, and EO = 1.8 eV, with the formulas of exponential tail states and Gaussian deep states.