Selection of metal ion irradiation for controlling Ti1−xAlxN alloy growth via hybrid HIPIMS/magnetron co-sputtering |
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Authors: | G. Greczynski J. LuM. Johansson J. JensenI. Petrov J.E. Greene L. Hultman |
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Affiliation: | a Department of Physics (IFM), Linköping University, SE-581 83 Linköping, Sweden b Seco Tools AB, Björnbacksvägen 2, SE-737 82 Fagersta, Sweden c Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, IL 61801, USA d Materials Science Department, University of Illinois, Urbana, IL 61801, USA e Department of Physics, University of Illinois, Urbana, IL 61801, USA |
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Abstract: | We demonstrate, for the first time, the growth of metastable single-phase NaCl-structure high-AlN-content Ti1−xAlxN alloys (x ≤ 0.64) which simultaneously possess high hardness and low residual stress. The films are grown using a hybrid approach combining high-power pulsed magnetron (HPPMS/HIPIMS) and dc magnetron sputtering of opposing metal targets. With HIPIMS applied to the Al target, Aln+ ion irradiation (dominated by Aln+) of the growing film results in alloys 0.55 ≤ x ≤ 0.60 which exhibit hardness H ∼ 30 GPa and low stress σ = 0.2-0.7 GPa, tensile. In sharp contrast, films with corresponding AlN concentrations grown with HIPIMS applied to the Ti target, giving rise to Tin+ ion irradiation (with a significant Ti2+ component), are two-phase - cubic (Ti,Al)N and hexagonal AlN - with low hardness, H = 18-19 GPa, and high compressive stress ranging up to 2.7 GPa. Annealing alloys grown with HIPIMS applied to the Al target results in age hardening due to spinodal decomposition; the hardness of Ti0.41Al0.59N increases from 30 to 33 GPa following a 900 °C anneal. |
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Keywords: | HIPIMS HPPMS TiAlN Ionized PVD |
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