基于SEMI标准的半导体工艺设备功能仿真系统设计 |
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引用本文: | 王巍,邹龙庆,徐华,李搏,贾培发,李垒. 基于SEMI标准的半导体工艺设备功能仿真系统设计[J]. 电子科技大学学报(自然科学版), 2012, 41(4): 599-604. DOI: 10.3969/j.issn.1001-0548.2012.04.024 |
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作者姓名: | 王巍 邹龙庆 徐华 李搏 贾培发 李垒 |
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作者单位: | 1.重庆邮电大学光电工程学院 重庆 南岸区 400065; |
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基金项目: | 02号国家科技重大专项(2009ZX02001-003);国家自然科学基金(60875073) |
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摘 要: | 设计实现了一个基于SEMI标准的半导体工艺设备仿真平台,该平台具有通用可配置特性。在该平台的基础上,构建了一套基于SEMI标准的气路功能仿真系统,该气路仿真系统包含了功能层、逻辑层和外部通信接口层,既能满足单独设备的功能仿真需求,也能对整个系统的功能进行仿真验证。该系统实现了对物理气相沉积(PVD)系统中,气路中阀门的闭合动作及气流变化等的实时仿真分析。
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关 键 词: | 功能仿真 物理气相沉积系统 半导体工艺设备 SEMI标准 |
收稿时间: | 2011-06-10 |
Design of Semiconductor Manufacturing Equipment Function Simulation System Based on SEMI Standard |
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Affiliation: | 1.College of Electronics Engineering,Chongqing University of Posts and Telecommunications Nan'an Chongqing 400065;2.State Key Laboratory of Intelligent Technology and Systems,Tsinghua National Laboratory for Information Science and Technology,Department of Computer Science and Technology,Tsinghua University Haidian Beijing 100084 |
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Abstract: | A general and configurable simulation platform based on SEMI standard is designed. On this general platform, a gas pressure subsystem simulation platform is implemented, which has the function layer, logic layer and communication interface layer. This system can meet the needs of both a single device and a whole system. Results show that the operation of the valve and the change of the gas flow in physical vapor deposition (PVD) system can be simulated in real time. |
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