| 脉冲激光溅射沉积光学增益薄膜实验研究 |
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| 引用本文： | 刘中凡,郝雪,周松强,朱文选,宋昌烈.脉冲激光溅射沉积光学增益薄膜实验研究[J].应用激光,2008,28(2):120-123. |
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| 作者姓名： | 刘中凡 郝雪 周松强 朱文选 宋昌烈 |
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| 作者单位： | 大连大学物理科学与技术学院,激光光电子实验室,辽宁,大连,116622 |
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| 摘 要： | 用脉冲激光沉积方法,以多靶交替溅射方式,在SiO2/Si基底上沉积镱铒共掺Al2O3光学薄膜,讨论了脉冲激光能量对薄膜沉积速率、表面形貌、光致发光强度的影响.在脉冲激光能量较高条件下制备出的薄膜的光致发光性能较好,脉冲激光能量较低条件下制备出的薄膜的表面形貌较均匀.综合放大器增益系数对光致发光强度和光刻工艺对薄膜表面形貌的要求,薄膜应该在合适的激光能量下制备.脉冲激光溅射沉积方法与中频磁控溅射方法相比,在抑制上转换发光方面具有优越性.
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| 关 键 词： | 脉冲激光沉积 镱铒共掺Al2O3薄膜 表面形貌 光致发光 脉冲激光溅射沉积 光学增益 光学薄膜 实验 研究 Pulsed Laser Deposition During Thin Films Optical Gain Study 上转换发光 溅射方法 磁控 脉冲激光能量 膜表面形貌 光刻工艺 增益系数 放大器 综合 均匀 |
| 收稿时间： | 2007/12/14 |
| 修稿时间： | 2007年12月14 |
Test Study on the Optical Gain Thin Films During Pulsed Laser Deposition |
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| Liu Zhongfan,Hao Xue,Zhou Songqiang,Zhu Wenxuan,Song Changlie.Test Study on the Optical Gain Thin Films During Pulsed Laser Deposition[J].Applied Laser,2008,28(2):120-123. |
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| Authors: | Liu Zhongfan Hao Xue Zhou Songqiang Zhu Wenxuan Song Changlie |
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| Affiliation: | Liu Zhongfan,Hao Xue,Zhou Songqiang,Zhu Wenxuan,Song ChanglieLaboratory of laser , photonics,College of Physical Science , Technology,Dalian University,Dalian,Liaoning 116622,China |
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| Abstract: | The optical thin films of Er3+/Yb3+ co-doped Al2O3 has been prepared by pulse laser deposition(PLD),with SiO2/Si on the silicon as matrix,in the way of several targets sputtering alternately.Comparisons of the thin films thickness,fluorescent intensity were made for depositions with different pulsed laser energies.The photoluminescence of the thin films were better with higher input power density,but with poorer surface topography and homogeneity.The thin films should be performed under lower pulsed laser e... |
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| Keywords: | Pulse laser deposition(PLD) Er3+/Yb3+ co-doped Al2O3films surface topography photoluminescence |
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