| 多弧离子沉积（Ti，AI）N薄膜的制备工艺 |
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| 引用本文： | 吴一平,乔学亮,陈建国,赵建生,孙培祯. 多弧离子沉积（Ti，AI）N薄膜的制备工艺[J]. 兵器材料科学与工程, 1995, 0(5) |
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| 作者姓名： | 吴一平 乔学亮 陈建国 赵建生 孙培祯 |
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| 作者单位： | 华中理工大学 |
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| 摘 要： | 介绍了采用多弧离子镀的方法在新型热作模具钢（ＣＨ７５）表面沉积（Ｔｉ，Ａｌ）Ｎ薄膜的制备工艺，讨论了工艺参数对（Ｔｉ，Ａｌ）Ｎ薄膜性能的影响。对Ｔｉ／Ａｌ机械复合靶进行了结构设计，得出靶的名义Ａｌ含量与沉积的（Ｔｉ，Ａｌ）Ｎ薄膜的Ａｌ含量相符合。
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| 关 键 词： | （Ti，Al）N薄膜，多弧离子镀，机械复合靶，水剂清洗 |
DEPOSITION TECHNIQUE OF(TI,Al)N FILM BY MULTI ARC ION |
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| Wu Yiping. DEPOSITION TECHNIQUE OF(TI,Al)N FILM BY MULTI ARC ION[J]. Ordnance Material Science and Engineering, 1995, 0(5) |
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| Authors: | Wu Yiping |
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| Abstract: | Deposition technique of(Ti,Al)N Film by Multi-arc ion plating on CH75 hot die steel was intrcduced in this paper.The influence of technologic parameter on property of(Ti,Al)N film was discussed.The structure of Ti/Al mechanic compound targets were designed and its content Of Al was shown no difference to(Ti,Al)N content of Al. |
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| Keywords: | Ti Al)N film multi-arc ion plating mechanic compounc target solvent clean |
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