Monte Carlo simulation of the particle transport process in sputter deposition

The essential features of the transport of sputtered particles from a target to a substrate during sputter deposition were studied by calculation using the Monte Carlo technique. The study takes into consideration the change in momentum as well as the kinetic energy loss of sputtered particles in their collisions with ambient gas molecules, to gain an understanding of the effects of these factors and of the number of sputtered particles arriving at a substrate on the mechanism of growth of a thin film by sputter deposition. Some theoretical predictions using the above calculation were made for several selected conditions of sputter deposition.