Photoelectrochemical properties of plasma-deposited TiO2 thin films |
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| Authors: | L.M. Williams D.W. Hess |
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| Affiliation: | Materials and Molecular Research Division, Lawrence Berkeley Laboratory, and Department of Chemical Engineering, University of California, Berkeley, CA 94720 U.S.A. |
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| Abstract: | Photoanodes were fabricated from TiO2 films deposited onto titanium substrates by plasma-enhanced chemical vapor deposition. The photocurrent-wavelength and photocurrent-voltage properties of the anodes were determined and compared with those of thermally grown TiO2 photoanodes. The plasma-deposited photoanodes displayed quantum efficiencies higher than those for the thermally grown films and comparable with those reported for single-crystal rutile. The microstructure of the plasma-deposited films appeared to be primarily responsible for the high quantum efficiencies. |
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