Surface-initiated atom transfer radical polymerization of polyhedral oligomeric silsesquioxane (POSS) methacrylate from flat silicon wafer |
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Authors: | Renxu Chen Shiping Zhu Gianluigi Botton Yiliang Wu |
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Affiliation: | a Department of Chemical Engineering, McMaster University, 1280 Main Street West, Hamilton, Ont., Canada L8S 4L7 b Materials Design and Integration Laboratory, Xerox Research Centre of Canada, Mississauga, Ont., Canada L5K 2L1 |
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Abstract: | A polyhedral oligomeric silsesquioxane (POSS) methacrylate monomer, i.e. 3-(3,5,7,9,11,13,15-heptacyclopentyl-pentacyclo [9.5.1.1.3,91.5,1517,13]-octasiloxane-1-yl) propyl methacrylate (POSS-MA), was directly grafted from flat silicon wafers using surface-initiated atom transfer radical polymerization (ATRP). Two methods were used to improve the system livingness and control of polymer molecular weights. By ‘adding free initiator’ method, a linear relationship between the grafted poly(POSS-MA) layer thickness and monomer conversion was observed. By ‘adding deactivator’ method, the poly(POSS-MA) thickness increased linearly with reaction time. Poly(POSS-MA) layers up to 40 nm were obtained. The chemical compositions measured by X-ray photoelectron spectroscopy (XPS) agreed well with their theoretical values. Water contact angle measurements revealed that the grafted poly(POSS-MA) was extremely hydrophobic. The surface morphologies of the grafted polymer layers were studied by an atom force microscopy (AFM). |
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Keywords: | Atom transfer radical polymerization (ATRP) Surface modification Polyhedral Oligomeric Silsesquioxane (POSS) |
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