Application of MO calculation to plasma-enhanced CVD using organosilicon compounds |
| |
| Authors: | Osamu Takai Atsushi Hozumi Yasushi Inoue Takashi Komori |
| |
| Affiliation: | (1) Department of Materials Processing Engineering, Nagoya University, Chikusa-ku, 464-01 Nagoya, Japan |
| |
| Abstract: | Ultra water-repellent films for which contact angles of water drops exceed 150° were prepared by microwave plasma-enhanced CVD using two kinds of organosilicon compound and fluoro-alkyl silane (FAS) at low substrate temperature. Hexamethyldisilane (HMDS) and hexamethyldisiloxane (HMDSO) were used as starting materials. Molecular orbital (MO) calculation suggested that HMDS was more easily decomposable than HMDSO. The films prepared with HMDS and FAS had ultra water repellency. On the other hand, water repellency of the films prepared with HMDSO and FAS was similar to that of polytetrafluoroethylene. |
| |
| Keywords: | MO calculation plasma enhanced CVD water repellency |
| 本文献已被 SpringerLink 等数据库收录！ |
