样品位置对多弧离子镀TiAlN薄膜表面质量的影响

采用多弧离子镀技术,在硅基体表面沉积TiAlN薄膜;固定试样与靶材间的距离,使试样表面与靶平面成0°、45°、60°、120°、135°、180°,研究偏转角度对薄膜表面质量的影响;固定试样与靶材的偏转角度(60°和120°),研究试样与靶材的距离(分别为240,265,295,325,350mm)对TiAlN薄膜质量的影响。采用三维白光干涉表面形貌仪、场发射环境扫描电子显微镜测试薄膜的表面粗糙度、表面形貌和厚度。结果表明:试样与靶材的偏转角度显著影响薄膜表面大颗粒的数量,而试样与靶材的距离则影响薄膜的厚度。TiAlN薄膜表面大颗粒物随偏转角度的增加明显减少,厚度随着试样与靶材距离的增加而减小。从靶材材料成分及蒸发出的粒子的分布、偏压电场下粒子的运动特性等方面讨论了基体和靶材的距离、偏转角度对薄膜沉积速率和大颗粒的影响机制。

Effect of Substrate Positioning on Surface Quality of TiAlN Films Deposited by Multi-Arc Ion Plating

TiAlN films were deposited on Si substrates using multi-arc ion plating techniques. Fixed the target-to-substrate distance, the effects of substrate/target angle (0°, 45°, 60°, 120°, 135°, 180°) on surface quality of the TiAlN films were studied. Effects of target-to-substrate distance (240, 265, 295, 325, 350 mm) on surface quality of the TiAlN films were also investigated, when the substrate/target angles were fixed at 60° and 120°, respectively. Surface roughness, surface morphology and thickness of the films were measured by using a three-dimensional white-light interferometer and a field emission environmental scanning electron microscope. The results show that substrate/target angle significantly influences the amount of macro particles and target-to-substrate distance remarkably influences the film thickness. When the substrate/target angle increased, the number of macro particles significantly reduced. The film thickness decreased with the increasing target-to-substrate distance. Influencing mechanism of target-to-substrate distance and substrate/target angle on the film deposition rate and macro particles was analyzed in view of the target material composition, the distribution of the vaporized particles and their motion characteristics in bias electric field.