首页 | 本学科首页   官方微博 | 高级检索  
     


Mathematical modeling and influence of ultrasonic pretreatment on microwave vacuum drying kinetics of lotus (Nelumbo nucifera Gaertn.) seeds
Authors:Yingting Zhao  Weiwei Wang  Baodong Zheng  Song Miao
Affiliation:1. College of Food Science, Fujian Agriculture and Forestry University, Fuzhou, Fujian, P. R. China;2. Fujian Provincial Key Laboratory of Quality Science and Processing Technology in Special Starch, Fuzhou, Fujian, P. R. China;3. Teagasc Food Research Centre, Fermoy, County Cork, Ireland
Abstract:The people of Southeast Asia often use lotus as a highly sought-after food source. Here, the effects of ultrasonic pretreatment on the drying kinetics of lotus (Nelumbo nucifera Gaertn.) seeds under microwave vacuum drying were investigated. The best fit model to predict the drying kinetics was also proposed. Lotus seeds were subjected to ultrasonic pretreatment at frequencies of 20, 35, and 80?kHz and power intensity of 0.75 and 1.50?W/g for 10?min using an ultrasonic bath and then to microwave vacuum drying. Five different mathematical models were fitted to the experimental data and a newly proposed model was selected based on model with highest regression coefficient (R2), lowest root mean square error (RMSE), sum square error (SSE), and chi-square (χ2), respectively. Time-domain nuclear magnetic resonance and field scanning electron microscope were used to describe the water state of ultrasonic samples and examine microstructure, respectively. The results showed that ultrasonic pretreatment performed at a relatively low frequency and relatively high power intensity had a positive effect on reducing the drying time (6.25–31.25%) during microwave vacuum drying because of the redistribution of water and the formation of microchannels. In parallel studies, the new model showed the best fit to the drying curve.
Keywords:Drying kinetics  lotus seeds  mathematical modeling  microwave vacuum drying  ultrasonic pretreatment  water state
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号