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掺硼CVD金刚石的电加工表面分析
引用本文:曹振中,褚向前,黎向峰,左敦稳.掺硼CVD金刚石的电加工表面分析[J].苏州大学学报(工科版),2004,24(5):78-80.
作者姓名:曹振中  褚向前  黎向峰  左敦稳
作者单位:南京航空航天大学机电学院,江苏,南京,210016
基金项目:国家自然科学基金资助项目(50075039)。
摘    要:金刚石具有一系列独特的力学、热学、声学、电学、光学和化学性能,在高科技领域具有广阔的应用前景。普通CVD金刚石膜是高度绝缘的,不能采用如电火花等加工导电聚晶金刚石(PCD)的方法和设备对其进行加工。本文通过掺硼实现了金刚石膜的导电。开展了电火花成型和线切割的实验研究,并通过SEM、Raman分析和粗糙度测量对加工后的表面进行了分析。

关 键 词:掺硼CVD金刚石  导电  电火花成型  线切割  粗糙度  表面质量
文章编号:1000-1999(2004)05-0078-03

Analysis on Electromachinied Surface of B-Doped CVD Diamond Film
CAO Zhen-zhong,CHU Xiang-qian,LI Xiang-feng,ZUO Dun-wen.Analysis on Electromachinied Surface of B-Doped CVD Diamond Film[J].Journal of Suzhou University(Engineering Science Edition),2004,24(5):78-80.
Authors:CAO Zhen-zhong  CHU Xiang-qian  LI Xiang-feng  ZUO Dun-wen
Abstract:Diamond has found its wider and wider applications in the field of high technology due to its excellent properties in mechanical, electrical, thermal, optical, acoustical and chemical aspects.Diamond film un-doped is highly insulated so that it can not be processed by electrical discharge machining (EDM) method, which is used widely in machining of PCD.In this paper, CVD diamond thick film was made conductive by boron-doping , and EDM shaping and wire cut were studied experimentally to process B-doped diamond thick film. Its electromachined surface was analyzed by means of SEM, Raman and Roughness Measurement.
Keywords:chemical vapor deposition  diamond thick film  electromaching  boron-doping
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