首页 | 本学科首页   官方微博 | 高级检索  
     


Identification of gate electrode discontinuities in submicron CMOStechnologies, and effect on circuit performance
Authors:Jenkins   K.A. Burghartz   J.N. Agnello   P.D.
Affiliation:IBM Res. Div., IBM Thomas J. Watson Res. Center, Yorktown Heights, NY;
Abstract:An experiment to determine the effect of gate electrode resistivity on circuit speed gave unexpected results: circuits with the lowest sheet resistance had the poorest circuit speed. Explanation of this behaviour required development of a new high-frequency method of measuring the impedance of the gate electrode. This method revealed that the circuits with a composite gate electrode had been formed with a partial discontinuity. The measurement technique is described, and the evidence of the discontinuity is shown. The effect of the discontinuity on device and circuit speed is demonstrated
Keywords:
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号