Diamond films with preferred <110> texture by hot filament CVD at low pressure |
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| Authors: | Shumin Yang Zhoutong He Qintao Li Dezhang Zhu Jinlong Gong |
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| Affiliation: | 1. Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China;2. Graduate School of the Chinese Academy of Sciences, Beijing 100039, China |
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| Abstract: | The effects of gas pressure on the textured growth of diamond films were investigated in a hot filament chemical vapor deposition (HFCVD) system. Diamond thin film with the growth rate of 1.3 μm/h and with high <110> texture was obtained at 5 Torr when lowering the gas pressure from 40 Torr to 1 Torr. The formation of high density nanocrystalline diamond nuclei elongated along the <110> direction in the nucleation stage and its consequent growth at lower pressure were considered to be responsible for the formation of <110> textured diamond thin film. |
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