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Photoconductivity of DLC film deposited by pulsed discharge plasma CVD
Authors:S Kawai  T Shinagawa  M Noda  M Umeno
Affiliation:1. Department of Electronics and Information Engineering, Chubu University, Kasugai, Aichi 487-8501, Japan;2. DENSO CORP. Research Laboratories, Komenoki, Nissin, Aichi 470-0111, Japan
Abstract:DLC films were deposited by a new pulsed DC discharge plasma chemical vapour deposition (CVD) using hydrogen and methane gas mixture. When methane concentration (Cm) i.e. CH4/(H2 + CH4) was increased from 3 to 40%, the graphitization of the carbon film increases as evident from Raman study. When Cm was increased to 30%, DLC film shows photoconducting property. The white light photoconductivity (S = Il/Id, where Il is light current and Id is dark current) measured with solar simulator under AM 1.5 condition was approximately 20 at room temperature. The photoconductivity was not clear when Cm was lower than 20%. ESR measurements also show that the electron spin density was slightly decreased with decreasing concentration of methane. Thus we can conclude here that at higher concentrations of methane at 30%, Sp2 content of the film increases and the DLC film becomes photoconducting.
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