Effect of substrate bias voltage on the properties of diamond-like carbon thin films deposited by microwave surface wave plasma CVD |
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Authors: | Sudip Adhikari Dilip Chandra Ghimire Hare Ram Aryal Golap Kalita Masayoshi Umeno |
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Affiliation: | 1. Department of Electronics and Information Engineering, Chubu University, 1200 Matsumoto-cho, Kasugai 487-8501, Japan;2. Department of Electrical and Electronic Engineering, Chubu University, 1200 Matsumoto-cho, Kasugai 487-8501, Japan |
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Abstract: | Diamond-like carbon (DLC) thin films were deposited on silicon and ITO substrates with applying different negative bias voltage by microwave surface wave plasma chemical vapor deposition (MW SWP-CVD) system. The influence of negative bias voltage on optical and structural properties of the DLC film were investigated using X-ray photoelectron spectroscopy, UV/VIS/NIR spectroscopy, Fourier transform infrared spectroscopy and Raman spectroscopy. Optical band gap of the films decreased from 2.4 to 1.7 with increasing negative bias voltage (0 to ? 200 V). The absorption peaks of sp3 CH and sp2 CH bonding structure were observed in FT-IR spectra, showing that the sp2/sp3 ration increases with increasing negative bias voltage. The analysis of Raman spectra corresponds that the films were DLC in nature. |
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