氧分压对电弧源制备TiO2薄膜光学性能和表面形貌的影响

为了寻求更加有效的方法和途径来制备高质量的光学薄膜,以直流磁过滤电弧源（УВНИПА？1-001型等离子体镀膜机）技术作为制备方法镀制TiO2光学薄膜,通过在不同氧分压的条件下制备TiO2光学薄膜.利用椭圆偏振光谱仪研究TiO2薄膜的光学性能,TayloyHobson轮廓仪研究TiO2薄膜的厚度和表面形貌.研究结果表明：制备出的TiO2薄膜随着氧分压的不断提高,在400～1 000nm的波长范围内折射率变化较大,在1 000～1 600nm的波长范围内折射率变化较为平稳;其消光系数在10-3数量级上;TiO2薄膜的吸收较小;TiO2薄膜的厚度和粗糙度呈现出先增大后减小的趋势.在氧分压为1.0Pa时,薄膜的表面未观察到明显的孔洞、裂纹等缺陷,所制备的薄膜致密且稳定性较好.

Effect of Oxygen Partial Pressure on Optical Properties and Morphology of Arc Ion Plating Prepared TiO2 Optical Thin Film

In order to seek more effective methods and approaches to prepare high quality optical film, based on the DC.magnetic filtered arc source （NBHHIIA-1-001 type plasma coating machine） technology, TiO2 optical thin film is prepared by plating at different partial oxygen pressure. The optical properties of TiO2 film is studied using elliptical polarization spectrograph,and the thickness and surface morphology are measured and observed by Tayloy Hobson profiler. The results show ： The refractive index of prepared TiO2 thin film changes remarkably in the wavelength of 400-1000 nm with the increase of partial oxygen pressure,while it is relatively smooth in the wavelength of 1 000-1 600 nm; The extinction coefficient is in the order of magnitude of 10-3; TiO2 film absorptivity is smaller; Film thickness and surface roughness of TiO2 film increase first and then decrease. While the partial pressure of oxygen is 1 Pa, no visible holes,cracks and other defects on the surface of the film are observed, the prepared film is dense and of good stability.