Application of sputtered ceramic TiC/a:C thin films with different structures by changing the deposition parameters

Titanium carbide-based thin films have been produced by DC magnetron sputtering. It was demonstrated that the same technology with changing of the deposition parameters, such as deposition temperature or power of Ti target, resulted in the preparation of TiC/a:C thin films with various structures. The structure of thin films and volume fraction of amorphous and crystal phases were precisely tailored by the control of deposition parameters. These ceramic nanocomposite TiC/a:C thin films according to their various structures, hence, their different mechanical, tribological, or wetting parameters can be used in wide range of applications.