| 同步辐射光刻技术 |
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| 引用本文： | 胡一贯.同步辐射光刻技术[J].量子电子学报,1991(3). |
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| 作者姓名： | 胡一贯 |
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| 作者单位： | 中国科学技术大学物理系 合肥，230026 |
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| 摘 要： | 同步辐射光刻有希望代替传统光刻技术,用于0.25μm以下图形的超精细加工。本文叙述了它的原理、相关技术的开发现状和工艺应用。
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| 关 键 词： | x射线光刻 同步辐射光刻 亚1/4微米技术 |
Lithography using Synchrotron Radiation (SRL) |
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| Hu Yiguang.Lithography using Synchrotron Radiation (SRL)[J].Chinese Journal of Quantum Electronics,1991(3). |
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| Authors: | Hu Yiguang |
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| Affiliation: | Hu Yiguang Department of Physics,University of Science and Technology of China |
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| Abstract: | Lithography using Synchrotron Radiation promises to take the place of the tradi-tional lithographty for the superfining of sub-quarter micron pattern. The principleand the development of the relative technology of SRL and its application are alsoreviewed in this paper. |
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| Keywords: | x--ray lithography (XRL) lithography using synchrotron radiation (SRL) sub--quarter micron technology |
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