Growth and Characterization of YBCO Thin Films by Sequential Deposition and Annealing |
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Authors: | X. Z. Liu Y. R. Li B. W. Tao |
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Affiliation: | (1) Institute of Microelectronics and Solid State Electronics, University of Electronic Science and Technology of China, Chengdu, 610054, P. R. China |
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Abstract: | A novel thin film growth procedure, sequential deposition and annealing (SDA), which contains the advantages of both in situ and ex situ procedures, was proposed. Y1Ba2Cu3O7 – x (YBCO) high temperature superconducting thin films were grown and characterized by the SDA procedure. Purely c-axis-oriented YBCO thin films with no foreign phases and other oriented grains were successfully prepared. The superconducting transition properties of SDA-grown YBCO thin films were measured by measurement of inductance and resistance. The inductance measurements gave a Tconset of 85 K and a Tc of 5 K. The resistance measurements gave a Tconset of 90 K and a Tc of 5 K. Atomic force microscopy studies showed that SDA-grown YBCO thin films had micrometer-size grains surrounded by many nanometer-size grains. The nanometer-size grains in SDA-grown YBCO thin films are responsible for degradation of superconducting transition properties. |
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Keywords: | deposition epitaxial growth superconductor YBCO thin films microstructure |
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