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As-grown textured zinc oxide films by ion beam treatment and magnetron sputtering
Authors:Wendi Zhang  Eerke BunteFlorian Ruske  Dominik KöhlAstrid Besmehn  Janine WorbsHilde Siekmann  Joachim KirchhoffAad Gordijn  Jürgen Hüpkes
Affiliation:
  • a Institut für Energieforschung 5-Photovoltaik, Forschungszentrum Jülich, 52425 Jülich, Germany
  • b Institute Silicon Photovoltaics, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, 12489 Berlin, Germany
  • c I. Physikalisches Institut IA, Rheinisch-Westfälische Technische Hochschule Aachen, 52074 Aachen, Germany
  • d Zentralabteilung für Chemische Analysen, Forschungszentrum Jülich, 52425 Jülich, Germany
  • Abstract:This work presents as-grown textured ZnO:Al films by rf magnetron sputtering initiated by pre-treatment of glass substrate with mixed argon and oxygen ions. A 650 nm thick of this film exhibits surface texture features with lateral size around 500 nm; the resistivity is below 5 × 10−4 Ω · cm and the transparency in the near-infrared spectral range is high (> 80% at 1000 nm). Microcrystalline silicon thin film solar cells grown on the textured glass exhibit excellent light trapping effect with a short circuit current density of 18.2 mA/cm².
    Keywords:Ion beam treatment  Magnetron sputtering  ZnO:Al films  TCO  Solar cells
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