电沉积纳米晶Co-B合金膜的影响因素

通过正交试验和单因素试验,发现电沉积纳米晶Co-B合金的镀速随镀液温度的升高、电流密度的增大、pH的增加而增大。在镀液稳定范围内,随硫酸钴、硼氢化钠质量浓度的增加而增大,随酒石酸钠质量浓度的增加而减小,当四硼酸钠达到一定质量浓度时,对镀速影响较小。在研究范围内所得合金膜全部为非晶态,扫描电子显微镜和扫描隧道电子显微镜观察发现,非晶镀层是由纳米相微粒构成微米级的二次颗粒,二次颗粒堆砌形成薄膜。

Influence Factors of Electrodeposition of Nano Crystal Co-B Alloy Film

Electrodeposition of nano crystal Co-B alloy film was studied with experiments designed by orthogonal experiment and single factor test methods.It was found in the experiments that the deposition rate of Co-B alloy film increases with the increase in current density,bath temperature and pH,increases with the increase in concentration of cobalt sulfate and sodium borohydride within the bath stable concentration range.The deposition rate decreases with the increase in concentration of sodium tartrate.Sodium tetraborate has little effect on deposition rate of Co-B alloy film when its concentration reaches a certain value.The Co-B alloy films obtained in the experiment all are in amorphous structure.It is found from the observation of SEM and STM that the amorphous coating of Co-B alloy is composed of secondary micrometre particles constituted by the initial nanometre particles.