Interferential lithography of 1D thin metallic sinusoidal gratings: Accurate control of the profile for azimuthal angular dependent plasmonic effects and applications |
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| Authors: | Filippo Romanato Husen Kartasasmita Kang Kwang Hong Lee Gianluca Ruffato Mauro Prasciolu Chee Cheong Wong |
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| Affiliation: | 1. School of Materials Science and Engineering, Nanyang Technological University, Block N4.1 - Nanyang Avenue, Singapore 639798, Singapore;2. Department of Physics, University of Padova, via Marzolo 8, Padova 35131, Italy;3. CNR-INFM TASC National Laboratory, Basovizza 34012, Trieste, Italy;1. University of Padova, Department of Information Engineering, via Gradenigo 6, 35131 Padova, Italy;2. University of Padova, Department of Physics and Astronomy, via Marzolo 8, 35131 Padova, Italy;3. Laboratory for Nanofabrication of Nanodevices, LaNN – Venetonanotech, CorsoStatiUniti 4, 35127 Padova, Italy;4. CNR-INFM TASC IOM National Laboratory, Area Science Park, S.S. 14 km 163.5, 34012 Basovizza, Trieste, Italy;5. University of Padova, Department of Pharmaceutical Sciences, Via Marzolo 5, 35131 Padova, Italy;1. Department of Materials Science and Engineering, University of Toronto, Toronto M5S 3E4, Canada;2. Department of Electrical and Computer Engineering, University of Toronto, Toronto M5S 3G4, Canada;1. University of Padova, Department of Physics and Astronomy, Via Marzolo 8, 35131 Padova, Italy;2. LaNN Laboratory for Nanofabrication of Nanodevices, Corso Stati Uniti 4, 35127 Padova, Italy;3. IOM-CNR, Area Science Park, Basovizza, Italy;4. University of Padova, Department of Pharmaceutical Sciences, Via Marzolo 5, 35131 Padova, Italy;5. Institute of Inorganic Chemistry and Surfaces (CNR-ICIS), Corso Stati Uniti 4, 35127 Padova, Italy;6. University of Padova, Department of Chemical Sciences, Via Marzolo 1, 35131 Padova, Italy;1. School of Optoelectronics, Beijing Institute of Technology, Beijing 100081, China;2. National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing 100871, China;3. National Key Laboratory for Electronic Measurement Technology, North University of China, Taiyuan 030051, China;1. College of Science, China University of Petroleum (East China), Qingdao, 266580, China;2. School of Science, Tianjin University, Tianjin, 300072, China;3. Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparation Technology, Tianjin, 300072, China;1. University of Padova, Department of Physics, Via Marzolo 8, 35131, Padova, Italy;2. LaNN Laboratory for Nanofabrication of Nanodevices, Corso Stati Uniti 4, 35127, Padova, Italy;3. IOM-CNR, Area Science Park, 34149, Basovizza, Italy;4. University of Padova, Department of Pharmaceutical Sciences, Via Marzolo 5, 35131, Padova, Italy |
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| Abstract: | Nonlinear processes involved in the manufacture of nominally sinusoidal surface relief diffraction gratings generated by interference lithography can introduce distortions into the profile of these surfaces. Such distortions may dramatically affect both the specular reflectivity and diffracted efficiencies from such a surface [H. Raether, Phys. Thin Film 9 (1977) 145–261]. We shall consider in particular the case of metallic gratings used to investigate plasmonic effects that can be engineered for bio-sensing applications. To investigate these effects, interference lithography (IL) has been used for the generation of profile controlled sinusoidal plasmonic crystals. IL exposure contrast study has been performed to control the amplitude oscillation and the surface roughness quality. Bi-metallic layer of silver and gold have been systematically deposited with different film thicknesses. A comprehensive numerical model that studies the optical coupling to surface plasmon polaritons on Ag/Au gratings has been undertaken for the simulation of the reflectivity and azimuthal angle dependence [Z. Chen, I.R. Hooper, J.R. Sambles, J. Opt. A: Pure Appl. Opt. 10 (1) (2008) 015007]. This computation illustrates the sensitivity of individual features to specific harmonic components of the surface, for surface plasmon resonances recorded in both the zeroth and higher diffracted orders. The roughness surface control after development and after bi-metallic evaporation strongly contributes to tighten the width of the reflectivity peak. Optimization process has shown that for an Ag (37 nm) and Au (7 nm) metallic bilayer, a semi-amplitude of 20 nm provides the best reflectivity. |
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