High thermal stability thick wall mesoporous titania thin films |
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| Authors: | Hui Li Jinshu Wang Hongyi Li Shu Yin Tsugio Sato |
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| Affiliation: | 1. School of Materials Science and Engineering, Beijing University of Technology, Beijing 100124, PR China;2. Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan;1. International Center for Materials Nanoarchitectonics (WPI-MANA), and Environmental Remediation Materials Unit, National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan;2. TU-NIMS Joint Research Center, School of Material Science and Engineering, Tianjin University, 92 Weijin Road, Tianjin, PR China;3. Graduate School of Chemical Science and Engineering, Hokkaido University, Sapporo 060-0814, Japan;1. Department of Neurology, University of Heidelberg, Germany;2. Department of Neurology, Heinrich-Heine University, Düsseldorf, Germany;1. School of Physics and Technology and Key Laboratory of Artificial Micro- and Nano-structure of Ministry of Education, Wuhan University, Wuhan 430072, China;2. School of Electrical Engineering and Automation, Henan Polytechnic University, Jiaozuo 454000, China;1. Department of Materials Science and Engineering, State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, China;2. The First Affiliated Hospital of Medical College, Zhejiang University, Hangzhou 310003, China;3. The Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China |
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| Abstract: | Mesoporous TiO2 thin films were prepared by using tetrabutyl titanate as the inorganic precursor and triblock copolymer (Pluronic F127) as the structure directing agent. The obtained mesostructured TiO2 thin film exhibits a high thermal stability, which can sustain 600 °C thermal treatment. The small angle XRD and wide angle XRD patterns indicate that the samples have mesoporous channel and are composed of anatase. The corresponding TEM images show that the homogeneous mesostructure and very thick pore walls (about 9–13 nm) are formed in the obtained thin films, which could be responsible for the high thermal stability of the framework. In addition, the samples have narrow pore diameter distribution and a mean pore size of 7.4 nm. |
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