Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks |
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Authors: | JKN Lindner C Seider F Fischer M Weinl B Stritzker |
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Affiliation: | Universität Augsburg, Institut für Physik, D-86135 Augsburg, Germany |
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Abstract: | Nanopatterning of silicon surfaces by means of He+ ion implantation through self-organized colloidal masks is reported for the first time. Nanosphere lithography (NSL) masks with mask openings of 46–230 nm width were deposited on Si(1 0 0) wafers. He+ ions were implanted through these masks in order to induce a local cavity formation and Si surface swelling. The surface morphology and the subsurface structure were studied using atomic force microscopy (AFM) and cross-sectional transmission electron microscopy (XTEM), respectively, as a function of mask and implantation parameters. It is demonstrated that regular arrays of both individual hillocks and trough-like circular rings can be generated. |
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