Fabrication tolerance analysis of grating mask for pattern-specific off-axis illumination |
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| Authors: | Young-Seok Kim Jong Ung Lee Sung Hyun Oh Yong Kyoo Choi Munsik Kim Beom-Hoan O Se-Geun Park El-Hang Lee Seung Gol Lee |
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| Affiliation: | 1. MicroPhotonics Advanced Research Center, School of Information and Communication Engineering, INHA University, 253 Yonghyun-Dong, Nam-Gu, Incheon 402-751, Republic of Korea;2. Laser and Optical Information Engineering, Cheongju University, 36, Naedok-dong, Sangdang-gu, Chungju-si, Chungbuk, Republic of Korea;3. Hynix Semiconductor Inc., Hyangjeong-dong, Hungduk-gu, Chungju-si, Chungbuk, Republic of Korea;1. State Key Laboratory of Electronic Thin Films and Integrated Devices, National Engineering Research Center of Electromagnetic Radiation Control Materials, University of Electronic Science and Technology of China, Chengdu 610054, People''s Republic of China;2. Institute of Electron Device & Application, Hangzhou Dianzi University, Hangzhou 310018, People''s Republic of China;1. UNESCO-UNISA Africa Chair in Nanosciences-Nanotechnology, College of Graduate Studies, University of South Africa, Muckleneuk ridge, PO Box 392, Pretoria, South Africa;2. Nanosciences African Network (NANOAFNET), iThemba LABS-National Research Foundation, 1 Old Faure road, Somerset West 7129, PO Box 722, Somerset West, Western Cape Province, South Africa;3. University of the Western Cape, Physics Department, Robert Sobukwe Road, Bellville, Cape Town, 7535, South Africa;4. Department of Mechanical Engineering, Politecnico di Milano, Via La Masa, 1, 20156, Milano, Italy;5. Institute for Photonics and Nanotechnologies (IFN) – CNR, Piazza Leonardo Da Vinci, 32, 20133, Milano, Italy;1. UA Microóptica & Óptica GRIN, Departamento de Física Aplicada, Facultade de Óptica e Optometría, Universidade de Santiago de Compostela, Campus Vida s/n, E-15782 Santiago de Compostela, Spain;2. Instituto de Ciencia de Materiales de Aragón (CSIC-Universidad de Zaragoza), María de Luna 3, E-50018 Zaragoza, Spain;3. Institut für Anorganische Chemie, Universität Bonn, Romerstraβe 164, D-53117 Bonn, Germany;1. Linné Flow Centre, KTH Mechanics, SE-100 44 Stockholm, Sweden;2. Dept. of Tech. and Built Env., University of Gävle, SE-80176 Gävle, Sweden;1. Heinrich-Heine-University Düsseldorf, Institute of Pharmaceutics and Biopharmaceutics, Düsseldorf, Germany;2. NextPharma Waltrop, Pharbil Waltrop GmbH, Waltrop, Germany;3. Christian-Albrechts-University Kiel, Institute of Electrical Engineering and Information Technology, Kiel, Germany;4. Döscher Microwave Systems GmbH, Hamburg, Germany |
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| Abstract: | In this paper, the effectiveness of grating mask proposed previously was evaluated for line and space patterns, and its fabrication tolerance was analyzed with aerial image simulation. The structure of grating mask was determined from the local features of Cr patterns. It was verified that grating mask could provide locally matched oblique illumination for specific patterns written on the Cr mask. When the fabrication errors of ±10% were randomly introduced into both the widths and the phases of phase gratings in the grating mask, the resulting aerial image showed the CD variation of 15.5%. In order to reduce CD variation to 5% and less, width and phase errors should be maintained to be less than 3.2% and 7.2%, respectively. |
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