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烟草蚀纹病毒弱株系的研究
引用本文:张满良. 烟草蚀纹病毒弱株系的研究[J]. 中国烟草学报, 1998, 4(1): 33-37
作者姓名:张满良
作者单位:西北农业大学植保系 杨陵 712100
摘    要:
1991~1995年利用钴60照射和亚硝酸处理进行了烟草蚀纹病毒(TEV)弱株系的选择及防病效果试验。结果表明,钴60照射病毒溶液能产生弱株突变体的适宜剂量是1.29C/kg和2.58C/kg,亚硝酸处理的适宜浓度和时间是1mol/L,30min~50min。以选择效果明显的弱株有R4和H38,其室内交互保护试验的效果最高值分别是85.8%和47.4%,田间防病效果分别为81.6%和40.3%。两个弱株免疫后接种强株,其烟株体内病毒含量均低于强株对照。试验还表明,亚硝酸处理较钻60能产生较多的弱株突变体。 

关 键 词:烟草蚀纹病毒   钴60和亚硝酸   弱株系选择
收稿时间:1998-02-15

Induced Mild Strains of Tobacco Etch Virus
Zhang Manliang. Induced Mild Strains of Tobacco Etch Virus[J]. Acta Tabacaria Sinica, 1998, 4(1): 33-37
Authors:Zhang Manliang
Affiliation:Department of protection, Northwestern Agricultural University, Yangling 712100
Abstract:
Mild strains of tobacco etch were studied. Suitable dosage of C treatment was1. 29C/kg and 2. 58C/kg for TEV produclng mutant. Sultable denslty of HNO2, treatment is 1 mol. L-1 and 30~50min. R4 strain and H,, strain were better. Protect effectof R4 and H38 were 85. 8 % in the greenhouse and 47. 4 % respectively. The effect of R4 tocontrol tobacco etch virus were 81. 6% in the field and whereas H,, were 40. 3 %. Viruscontent of immune plant was lower than chek. The results showed that HNO2, treatmentcan produce more mutant than C60.
Keywords:Tobacco etch virus Mild Strain Controlling virus effect
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