Dopant incorporation in GaAs and AlGaAs grown by MOMBE for high speed devices |
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Authors: | C R Abernathy F Ren S J Pearton J Song |
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Affiliation: | (1) AT&T Bell Laboratories, 07974 Murray Hill, NJ;(2) Massachusetts Institute of Technology, 02139 Cambridge, MA |
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Abstract: | Continued improvement in GaAs/AlGaAs device technology requires higher doping levels, both to reduce parasitics such as source
resistances, and to enhance speed in devices such as the heterostructure bipolar transistor (HBT). In this paper we will discuss
doping issues which are critical to high speed performance. In particular, we will focus on doping of GaAs and AIGaAs using
carbon as the acceptor and Sn as the donor. Due to the unique growth chemistry of metalorganic molecular beam epitaxy (MOMBE),
both of these impurities can be used to achieve high doping levels when introduced from gaseous sources such as trimethylgallium
(TMG) or tetraethyltin (TESn). Comparison of SIMS and Hall measurements show that both elements give excellent electrical
activation to 1.5 × 1019 cm3 for Sn and 5 × 1020 cm−3 for C. More importantly, we have found that both impurities canbe used to achieve high quality junctions, indicating that
little or no diffusion or segregation is occurring during growth. Because of the excellent incorporation behavior of these
dopants, we have been able to fabricate a wide range of devices including field effect transistors (FETs), high electron mobility
transistors (HEMTs), and Pnp HBTs whose performance equals or exceeds that of similar devices grown by other techniques. In
addition to these results, we will briefly discuss the key differences in growth kinetics which allow such abruptness and
high doping levels to be achieved more readily in MOMBE than in other growth techniques. |
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Keywords: | AlGaAs GaAs transistors MOMBE |
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