抛光液温控装置结构设计及温度场分析

为精确控制超光滑表面抛光过程中抛光液的温度,根据温控基本原理设计温控装置结构.将用UG建立的温控装置模型导入GAMBIT中进行温度场分析.针对装置内部温度分布不均匀问题,对其结构进行优化：在装置内加入导热隔板将其分为工作区和调温区,制冷器被置于调温区内;将温控装置的外形结构加入过渡圆角.结果表明：优化后的温控装置形成内外环流,工作区温度波动范围为±0.01℃,温度分布均匀对称,满足高精度温控的恒温和匀温要求.

Structure design and temperature field analysis of slurry temperature control device

To control the temperature of slurry accurately in the process of ultra-smooth surface polishing,the structure of a temperature control device is designed according to the basic principles of temperature control.The model built by UG is imported into GAMBIT to analyze the temperature field.As to the non-uniform temperature distribution inside the device,the structure is optimized.For the optimization,a conductivity separator is placed in the device to divide the space into work area and temperature adjusting area,and the cooler is placed in the temperature adjusting area;transition fillets are added on the shape structure.The results show that inside and outside circulations can be formed in the optimized device,the temperature fluctuation range in the working area is ±0.01 ℃,and the temperature distribution is uniform and symmetrical,which meets the requirement of constant and uniform temperature distribution for high accuracy temperature control.