Electrochemically Induced Oscillations of C2H4 Oxidation Over Thin Sputtered Rh Catalyst Films

The electrochemically promoted induction of self-sustained catalytic rate and potential oscillations during C₂H₄ oxidation was studied over sputtered Rh thin (40 nm catalyst films interfaced with ZrO₂ (8 mol% Y₂O₃). The reaction rate oscillates simultaneously with the catalyst potential, and always in the opposite direction. The electrochemically induced oscillatory rate is typically 60 times larger than the open-circuit catalytic rate and 1000 times larger than the electrochemical rate of O²⁻ supply to the catalyst. The phenomenon is completely reversible and only observed under anodic polarization where the rate oscillates between the values corresponding to metallic Rh and surface Rh₂O₃. The oscillations are caused by the electrochemically controlled backspillover of O²⁻ to the catalyst surface and the concomitant, via repulsive lateral interactions, decomposition of surface rhodium oxide followed by surface reoxidation to Rh₂O₃ by gaseous O₂.