| 激光低温沉积金刚石膜 |
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| 引用本文： | 冯钟潮,张炳春,赵岩,王亚庆. 激光低温沉积金刚石膜[J]. 材料研究学报, 1996, 10(5): 521-524 |
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| 作者姓名： | 冯钟潮 张炳春 赵岩 王亚庆 |
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| 作者单位： | 中国科学院金属研究所 |
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| 摘 要： | 用ＸｅＣｌ紫外与ＣＯ２红外复合激光化学气相沉积方法，在３４０℃硅衬底上沉积成高纯金刚石膜。
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| 关 键 词： | 金刚石 激光 化学气相沉积 低温 薄膜 |
| 收稿时间： | 1996-10-25 |
| 修稿时间： | 1996-10-25 |
LOW-TEMPERATURE DEPOSITION OF DIAMOND FILM BY LASER CVD |
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| FENG Zhongchao,ZHANG Bingchun,ZHAO Yan,WANG Yaqing. LOW-TEMPERATURE DEPOSITION OF DIAMOND FILM BY LASER CVD[J]. Chinese Journal of Materials Research, 1996, 10(5): 521-524 |
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| Authors: | FENG Zhongchao ZHANG Bingchun ZHAO Yan WANG Yaqing |
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| Affiliation: | FENG Zhongchao,ZHANG Bingchun,ZHAO Yan,WANG Yaqing(Institute of Metal Research,Chinese Academy of Sciences) |
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| Abstract: | Diamond films have been synthesized by LCVD through combined effect of ultraviolet XeCl laser and infrared CO2 laser. The substrates are Si wafers. A special apparatus has been developed. The deposition conditions have been studied. Raman spectra of the films show a well-defined sharp peak at 1332cm-1 which is the characteristic of diamond. The morphology of diamond crystal of the films is very clear under SEM. It has been confirmed that the films are of high pure diamond. The threshod deposition temperature is 340t. The roles of each laser are discussed. |
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| Keywords: | diamond laser chemical vapor deposition low temperature |
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