Evaluation and origins of the difference between double-layer capacitance behaviour at Au-metal and oxidized Au surfaces

In studies of processes at oxidized compared with unoxidized electrode surfaces by transient methods corrections for double-layer charging are usually required and have often been made by extrapolation of double-layer capacitance (C_dl) data for the metallic surface, e.g. at Au or Pt, into the potential region of oxide-film formation. Voltammetry and impedance spectroscopy provide direct information on C_dl values determined at unoxidized, i.e. metallic, Au surfaces compared with those of anodic oxide films generated potentiostatically to various extents that are stable in time, and characterized by reductive linear-sweep voltammetry. C_dl is derived from constant-phase element (CPE) values and the CPE parameter, ?, which is near unity for most conditions. At oxidized Au surfaces C_dl depends on potential for various extents of oxide formation; it increases from 15 (±1) μF cm⁻² at 1.75 V (RHE) to 25 (±1) μF cm⁻² at 1.45 V (RHE) and is independent of added Cl⁻ or Br⁻ for concentrations 0-10⁻³ M of both anions, while, at unoxidized Au electrodes in the absence of halide anions, C_dl has a maximum value of 60 (±2) μF cm⁻² at 0.80 V (RHE) and is now dependent on concentration of added Cl⁻ or Br⁻ ion. These major differences of C_dl for the oxidized and unoxidized Au surfaces indicate that double-layer charging corrections cannot be made simply by extrapolation of C_dl data for unoxidized Au metal surfaces into the potential region for oxide formation.