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An investigation by electron spectroscopy for chemical analysis of chemical treatments of the (100) surface of n-type InP epitaxial layers for Langmuir film deposition |
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| Authors: | D T Clark T Fok |
| Affiliation: | a Department of Chemistry, University of Durham, South Road, Durham City, Gt. Britain b Department of Applied Physics, University of Durham, South Road, Durham City, Gt. Britain |
| Abstract: | The surface chemistry of InP substrates used for the fabrication of electronic devices (MIS structures) was examined by ESCA. Spectroscopic data on related materials such as indium metal, plasma-oxidized indium metal, In2O3, InPO4(xH2O), P4O10, AlPO4, (C6H5O)3PO and (C6H5)3P were collected so as to aid the assignment of components in the spectra of as-received and etched InP surfaces on the basis of the chemical shifts and the intensity ratios. Surface features of InP substrates from several batches were examined in the as-received and the chemically etched forms. The effectiveness of several types of etchants and the features thus produced on the substrate surface were evaluated and are discussed. |
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