| 等离子体增强化学气相淀积a-SiCOF薄膜的稳定性研究 |
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| 引用本文： | 丁士进,张庆全,王鹏飞,张卫,王季陶. 等离子体增强化学气相淀积a-SiCOF薄膜的稳定性研究[J]. 高技术通讯, 2001, 11(11): 52-55 |
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| 作者姓名： | 丁士进 张庆全 王鹏飞 张卫 王季陶 |
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| 作者单位： | 复旦大学电子工程系, |
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| 基金项目： | 国家自然科学基金 ( 6 9776 0 2 6 )，高等学校骨干教师计划资助项目 |
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| 摘 要： | 以正硅酸乙酯（TEOS）／C4F8／Ar为气源，采用等离子体增强化学气相淀积（PECVD）方法制备了低价电常数a-SiCOF介质薄膜，并借助X射线光电子能谱（XPS）和傅立叶变换红外光谱（FTIR）对薄膜的化学键结构、热稳定性和抗吸水性进行了研究。
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| 关 键 词： | 等离子体增强化学气相淀积 a－SiCOF薄膜 稳定性 XPS FTIR 红外光谱 掺碳 掺氟 氧化硅薄膜 |
Study on Stability of a-SiCOF Films Deposited by Plasma Enhanced Chemical Vapor Deposition |
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| Ding Shijin,Zhang Qingquan,Wang Pengfei,Zhang Wei,Wang Jitao. Study on Stability of a-SiCOF Films Deposited by Plasma Enhanced Chemical Vapor Deposition[J]. High Technology Letters, 2001, 11(11): 52-55 |
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| Authors: | Ding Shijin Zhang Qingquan Wang Pengfei Zhang Wei Wang Jitao |
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| Abstract: | Low-dielectric-constant a-SiCOF films have been prepared from TEOS, C 4F 8 and Ar by using plasma enhanced chemical vapor deposition method. With the aid of X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FTIR), the chemical bonding configuration, thermal stability and resistance to water of the films are explored. |
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| Keywords: | Plasma enhanced chemical vapor deposition a-SiCOF films Stability XPS FTIR |
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