Large array of sub-10-nm single-grain Au nanodots for use in nanotechnology |
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Authors: | Clément Nicolas Patriarche Gilles Smaali Kacem Vaurette François Nishiguchi Katsuhiko Troadec David Fujiwara Akira Vuillaume Dominique |
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Affiliation: | Institut d'Electronique Microélectronique et Nanotechnologie, CNRS, Univ. of Lille, Avenue Poincaré, 59652, Villeneuve d'Ascq, France. nicolas.clement@iemn.univ-lille1.fr |
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Abstract: | A uniform array of single-grain Au nanodots, as small as 5-8 nm, can be formed on silicon using e-beam lithography. The as-fabricated nanodots are amorphous, and thermal annealing converts them to pure Au single crystals covered with a thin SiO(2) layer. These findings are based on physical measurements, such as atomic force microscopy (AFM), atomic-resolution scanning transmission electron microscopy, and chemical techniques using energy dispersive X-ray spectroscopy. A self-assembled organic monolayer is grafted on the nanodots and characterized chemically with nanometric lateral resolution. The extended uniform array of nanodots is used as a new test-bed for molecular electronic devices. |
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Keywords: | nanodots ultimate lithography molecular electronics nanoparticles electrodes |
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