| 干法腐蚀 |
| |
| 引用本文： | 袁明文. 干法腐蚀[J]. 微纳电子技术, 1991, 0(1) |
| |
| 作者姓名： | 袁明文 |
| |
| 作者单位： | 机电部第13研究所 石家庄 |
| |
| 摘 要： | 本文介绍等离子体腐蚀工艺、诊断和终点检测方法,包括有关的腐蚀机理以及气体组分的比较。同时,指出等离子体腐蚀工艺的发展趋势。
|
| 关 键 词： | 等离子体 腐蚀 半导体工艺 |
Dry Etching |
| |
| Yuan Miagwen. Dry Etching[J]. Micronanoelectronic Technology, 1991, 0(1) |
| |
| Authors: | Yuan Miagwen |
| |
| Abstract: | The plasma etching technology,diagnosis,and approach to the end-point detection,including the related etching mechanism and comparison of various etching gas components, are described in this paper.Moreover,the tendency of the technology is indicated. |
| |
| Keywords: | Plasma Etching Semiconductor technology |
| 本文献已被 CNKI 等数据库收录！ |
|
