Sorption Behavior and Mechanism of Indium( Ⅲ ) onto Amino Methylene Phosphonic Acid Resin |
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摘 要: |
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关 键 词: | 吸附作用 铟 氨基亚甲基磷酸树脂 APAR 热动力学参数 |
收稿时间: | 15 September 2001 |
Sorption behavior and mechanism of indium(III) onto amino methylene phosphonic acid resin |
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Authors: | Xiong Chun-hua Lu Bi-wen Wang Yong-jiang |
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Affiliation: | (1) Department of Chemistry, Lishui Teachers College, 323000 Lishui, China |
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Abstract: | The sorption behavior of amino methylene phosphonic acid resin (APAR) for In(III) was investigated. Experimental results show
that In(III) adsorbed on APAR can be eluted with 2mol·L−1 HCl. The apparent rate constant is k298=1.50×10−5s−1. The sorption behavior of APAR for In(III) obeys the Freundlich isotherm. The thermodynamic parameters of sorption, enthalpy
change ΔH, free energy change ΔG and entropy change ΔS of sorption (APAR) for In(III) are 24.1kJ·mol−1, −35.1kJ·mol−1 and 200J·mol−1·K−1, respectively. The coordination molar ratio of the functional group of APAR to In(III) is 2∶1. The sorption mechanism of
APAR for In(III) was examined by IR spectrometry.
XIONG Chun-hua: Born in 1959
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This project was supported by Foundation of Zhejiang Provincial Education Bureau(No.20010677) and Lishui Science and Technology
Bureau(No.2001012). |
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Keywords: | Amino methylene phosphonic acid resin indium sorption mechanism |
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