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Monte Carlo simulation for the sputtering yield of Si3N4 thin film milled by focused ion beams |
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| Authors: | TAN Yong-wen SONG Yu-min ZHOU Peng WANG Cheng-yu YANG Hai |
| Affiliation: | [1]Department of Physics, Yunnan Normal University, Kunming 650092, China |
| Abstract: | The sputtering yield of the Si3N4 thin film is calculated by Monte Carlo method with different parameters. The dependences of the sputtering yield on the incident ion energy, the incident angle and the number of Gallium (Ga) and Arsenic (As) ions are predicted. The abnormal sputtering yield for As at 90 keV occurs when the incident angle reaches the range between 82°and 84°. |
| Keywords: | thin film sputtering yield simulation Monte Carlo method abnormal range ions Arsenic angle number Gallium energy different parameters |
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