CrAIN／TiAIN纳米多层膜的微结构及其性能研究

采用磁控反应溅射法制备了不同调制周期的CrAIN／TiAIN纳米多层膜，并通过x射线衍射仪、显微硬度计、扫描电镜分析了调制周期对多层膜的微结构、力学性能和高温抗氧化性能的影响。结果表明：CrAIN／TiAIN纳米多层膜共格外延生长，呈现CrAIN（或TiAIN）面心立方结构，且呈（111）择优取向；CrAIN／TiAIN纳米多层膜在某些调制周期出现硬度异常升高的超硬度效应；CrAIN／TiAIN纳米多层膜比CrAIN,TiAIN单层膜具有更好的高温稳定性，高温时仍具有较高的硬度。

Study on Microstructure and Properties of CrA1N/TiA1N Nanostructured Multilayers

CrAIN/TiAIN multilayer films with different modulation periods were deposited by reactive magnetron sputtering. The impacts of modulation periods to the microstructures, mechanical properties and oxidation resistance at high temperature for the films were characterized by X-ray diffraction （XRD）, micro hardness tester and scanning electron microscopy （SEM）. It was found that the films took the fcc-CrAlN （or fcc-TiAIN） structure with a （111） preferential orientation, which resulted from epitaxial growth. The CrAIN/TiAIN multilayer films reached an unusual hardness at a certain modula-tion periods. The films had better high temperature stability than the monolayer of CrAIN and TiAIN, and showed higher hardness even in high temperature.